Auger- and X-Ray Photoelectron Spectroscopy in Materials Science [electronic resource] : A User-Oriented Guide / by Siegfried Hofmann.Material type: TextSeries: Springer Series in Surface Sciences: 49Publisher: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2013Description: XX, 528 p. online resourceContent type: text Media type: computer Carrier type: online resourceISBN: 9783642273810Subject(s): Physics | Solid state physics | Spectroscopy | Microscopy | Materials -- Surfaces | Thin films | Physics | Solid State Physics | Spectroscopy and Microscopy | Surfaces and Interfaces, Thin FilmsAdditional physical formats: Printed edition:: No titleDDC classification: 530.41 LOC classification: QC176-176.9Online resources: Texto completo
|Item type||Current location||Shelving location||Call number||Status||Date due||Barcode||Item holds|
|Springer (Colección 2013)||BIBLIOTECA GENERAL||Química y Ciencias de Materiales||Química y Ciencias de Materiales (Browse shelf)||Available|
Browsing BIBLIOTECA GENERAL shelves, Shelving location: Química y Ciencias de Materiales Close shelf browser
|Química y Ciencias de Materiales Advances in Natural Polymers||Química y Ciencias de Materiales Natural Products||Química y Ciencias de Materiales Scanning Probe Microscopy in Nanoscience and Nanotechnology 3||Química y Ciencias de Materiales Auger- and X-Ray Photoelectron Spectroscopy in Materials Science||Química y Ciencias de Materiales Acoustic Scanning Probe Microscopy||Química y Ciencias de Materiales Primary Explosives||Química y Ciencias de Materiales Polymer Synthesis: Theory and Practice|
Outline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples).
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. .